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Effect of arsenic precipitates on Fermi level in GaAs grown by molecular-beam epitaxy at low temperature (2000)

Chen, Y. H. ; Wang, Z. G.

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 87 (2000), S. 2923-2925

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: A simple model is presented to discuss the effect of As precipitates on the Fermi level in GaAs grown by molecular-beam epitaxy at low temperature (LT-GaAs). This model implements the compensation between point defects and the depletion of arsenic precipitates. The condition that the Fermi level is pinned by As precipitates is attained. The shifts of the Fermi level in LT-GaAs with annealing temperature are explained by our model. Additionally, the role of As precipitates in conventional semi-insulating GaAs is discussed. © 2000 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.372278

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