Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
91 (2002), S. 1204-1208
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The amorphous Ir–Si layer of several nanometers thick on Si(100)2×1 deposited at room temperature has been characterized by using both low energy electron diffraction (LEED) and synchrotron photoemission techniques. The double domain Si(100)2×1 LEED pattern disappeared when the deposited Ir onto Si(100) was higher than 1 ML. The ultrathin amorphous Ir–Si layer consisted of three different IrxSiy alloys, rather than a single homogeneous IrxSiy alloy as predicted by the conventionally used Gibbs free energy calculation in the solid state amorphization. The growth of the amorphous Ir–Si layer on Si(100) strongly depended on the interaction between Ir and Si(100) at the initial stage of Ir deposition. Three types of Ir–Si bonding formed on Si(100) at 1 ML Ir coverage and gradually evolved to be three different amorphous IrxSiy alloys. The growth mode of the amorphous Ir–Si layer was proposed to be the modified Stranski–Krastanov growth. The transition from layer-by-layer-like to island growth occurred at Ir coverage of ∼3 ML. The major amorphous IrxSiy alloy switched from Si to Ir rich when Ir coverage is over ∼3 ML. © 2002 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1430885
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