Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
76 (2000), S. 1773-1775
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
A polymer composed of ruthenium carbonyl and of the formula [Ru6C(CO)15Ph2PCCPPh2]n has been synthesized. It is found to behave as a negative electron-beam resist with a sensitivity of 400 C/m2. Upon exposure to the electron beam, the electrical conductivity of the patterned films is found to vary over seven orders of magnitude according to a power-law dependence on dose. Temperature dependence of the conductivity is studied, and the conduction is attributed to variable-range hopping between ruthenium superclusters in two dimensions. © 2000 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.126163
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