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Deep submicron microcontact printing on planar and curved substrates utilizing focused ion beam fabricated printheads (2001)

Longo, D. M. ; Benson, W. E. ; Chraska, T. ; [et al.]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 78 (2001), S. 981-983

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: Focused ion beam (FIB) fabrication of nanostructured "printheads" is used to extend applications of microcontact printing. Planar and curved printheads are fabricated with feature sizes less than 100 nm over fields of view of order 1 mm2, and transferred to target substrates with spatial resolution of order 200 nm. Analysis of the mechanical and ion optical stabilities of the FIB demonstrates that several hours of printhead fabrication time are possible with nanoscale precision. The rapid prototyping capability of this approach and the large depth of focus in the FIB enable rapid nanoscale patterning of a wide range of surface geometries. © 2001 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.1348308

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