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Atomic oxygen surface loss coefficient measurements in a capacitive/inductive radio-frequency plasma (2002)

Gomez, S. ; Steen, P. G. ; Graham, W. G.

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 81 (2002), S. 19-21

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: Spatially resolved measurements of the atomic oxygen densities close to a sample surface in a dual mode (capacitive/inductive) rf plasma are used to measure the atomic oxygen surface loss coefficient β on stainless steel and aluminum substrates, silicon and silicon dioxide wafers, and on polypropylene samples. β is found to be particularly sensitive to the gas pressure for both operating modes. It is concluded that this is due to the effect of changing atom and ion flux to the surface. © 2002 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.1490630

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