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  • Articles  (7,295)
  • Engineering  (7,247)
  • modeling  (48)
  • Technology  (7,295)
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  • 1
    Electronic Resource
    Electronic Resource
    Monitoring and modeling of coastal waters in support of environmental preservation (1996)
    Springer
    Journal of marine science and technology 1 (1996), S. 75-84 
    Details
    ISSN: 1437-8213
    Keywords: monitoring ; modeling ; environmental preservation ; navigation ; nazardous spills ; tidal prediction
    Source: Springer Online Journal Archives 1860-2000
    Topics: Geosciences , Technology
    Notes: Abstract The improved monitoring and modeling capability resulting from recent technological advances in oceanographic sensors, computer processing power, and telecommunications can play a major role in environmental preservation. In particular, this capability can help improve: safe navigation and thus the prevention of maritime accidents that lead to hazardous spills; the effective cleanup of hazardous spills when they do occur; the real-time assessment of water quality problems; the assessment of long-term trends and variability due to both anthropogenic and climate change effects; and the understanding of key physical, chemical, and ecological processes.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF02391163
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  • 2
    Electronic Resource
    Electronic Resource
    The induction plasma chemical reactor: Part I. Equilibrium model (1990)
    Springer
    Plasma chemistry and plasma processing 10 (1990), S. 133-150 
    Details
    ISSN: 1572-8986
    Keywords: Induction plasma ; modeling ; chemical equilibrium ; silicon nitride synthesis
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A mathematical model is presented for the numerical simulation of the flow, temperature, and concentration fields in an rf plasma chemical reactor. The simulation is performed assuming chemical equilibrium. The extent of validity of this assumption is discussed. The system considered is the reaction of SiCl4 and NH3 for the production of Si3N4.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01460452
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  • 3
    Electronic Resource
    Electronic Resource
    The induction plasma chemical reactor: Part II. Kinetic model (1990)
    Springer
    Plasma chemistry and plasma processing 10 (1990), S. 151-166 
    Details
    ISSN: 1572-8986
    Keywords: Induction plasma ; modeling ; chemical kinetics ; dissociation of silicon tetrachloride
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A kinetic model has been developed for the prediction of the concentration gelds in an rf plasma reactor. A sample calculation for a SiCl4/H2 system is then performed. The model considers the mixing processes along with the kinetics of seven reactions involving the decomposition of these reactants. The results obtained are compared to those assuming chemical equilibrium. The predictions indicate that an equilibrium assumption will result in lower predicted temperature fields in the reactor. Furthermore, for the chemical system considered here, while differences exist between the concentration fields obtained by the two models, the differences are not substantial.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01460453
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  • 4
    Electronic Resource
    Electronic Resource
    Modeling of an inductively coupled plasma at reduced pressures (1990)
    Springer
    Plasma chemistry and plasma processing 10 (1990), S. 167-188 
    Details
    ISSN: 1572-8986
    Keywords: Nonequilibrium plasma ; modeling ; RF plasma sintering
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Plasma sintering experiments in this laboratory at reduced pressures revealed efficient heating of the ceramic sample due to recombination of dissociated and/or ionized species on the surface. For establishing a model for this plasma sintering process, it is necessary to first consider the plasma itself. Therefore, a suitable model for an RF inductively coupled plasma has been developed considering reduced pressures. As the pressure decreases, the electron density also decreases at a fixed electron temperature, causing substantial deviations from chemical equilibrium. Due to the poor collisional coupling between electrons and heavy particles at reduced pressures, large deviations from kinetic equilibrium have also to be expected. The model is based on a rotationally symmetric plasma contained in a quartz tube. The power level ranges from 1.5 to 3 kW and the operating pressure is varied from 1 to 0.01 atm. Both deviations from chemical and kinetic equilibrium are included in this model. Thermodynamic and transport properties for two-temperature plasmas are used for this modeling work. The results indicate that for pressures below 0.1 atm, there is a strong ambipolar flux of charge carriers to the confining walls, leading to significant variations of the temperature across the tube. The electron temperature increases rapidly as the pressure decreases, whereas the heavy-particle temperature decreases.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01460454
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  • 5
    Electronic Resource
    Electronic Resource
    One-dimensional analysis of the wall region for a multiple-temperature argon plasma (1990)
    Springer
    Plasma chemistry and plasma processing 10 (1990), S. 189-206 
    Details
    ISSN: 1572-8986
    Keywords: Thermal plasmas ; modeling ; heat and mass transfer
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract The present analysis is restricted to the wall region for a confined gas plasma and applied specifically to an argon plasma. The wall may be either positive or negative in potential with respect to the plasma, and the electric current may flow either parallel or normal to the wall. Estimates of the Debye shielding distance and the mean free path of various components are made to obtain the range of validity of the analysis, in addition to the situation where the wall acts like a cathode, an anode, or an electrical insulation. Analysis is for a one-dimensional case with an outer boundary, where the plasma temperature is specified. The computational domain is split into a continuum region, where both equilibrium compositions for a two-temperature plasma and a chemically reacting plasma are studied, and a free-fall region. The results allow a quantitative assessment of temperature nonequilibrium and electrical potential distribution in the free-fall region.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01460455
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  • 6
    Electronic Resource
    Electronic Resource
    A model for the etching of silicon in SF6/O2 plasmas (1990)
    Springer
    Plasma chemistry and plasma processing 10 (1990), S. 207-229 
    Details
    ISSN: 1572-8986
    Keywords: Plasma etching ; modeling ; SF6 ; O2 ; gas-phase reactions
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract A model has been developed to describe the chemistry which occurs in SF6/O2 plasmas and the etching of silicon in these plasmas. Emphasis is placed nn the gas-phase free radical reactions, and the predictions n( the model are compared with experimental results. Forty-seven reactions are included, although a subset of 18 reactions describes the chemistry equally well. Agreement between the calculated and measured concentrations of stable products downstream of the plasma is better than a factor of 2. The need for additional kinetic data and fàr well-characterized diagnostic studies of SF6/O2 plasmas is discussed.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01447127
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  • 7
    Electronic Resource
    Electronic Resource
    Modeling of the plasma sintering process at reduced pressures (1990)
    Springer
    Plasma chemistry and plasma processing 10 (1990), S. 305-319 
    Details
    ISSN: 1572-8986
    Keywords: Thermal plasma sintering ; reduced pressures ; modeling
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Numerical simulation of the thermal behavior of sintering specimen under RF plasma conditions at reduced pressure is considered. A two-dimensional approach is adopted for describing flow, temperature, and electromagnetic fields in the reactor with appropriate boundary conditions. Slip boundary conditions are imposed for the velocity field at the sample surface and at the wall of the reactor, and corresponding jump boundary conditions are specified for the temperature field. Simple kinetic theory is employed for the calculation of the heat flux from the plasma to the specimen. The so-called capture-radiative-cascade model is adopted for ionization and recombination processes. The results indicate that ion-electron surface recombination is the dominant heat transfer mechanism to the sintering specimen under reduced pressure conditions.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01447133
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  • 8
    Electronic Resource
    Electronic Resource
    EPR investigation of plasma-chemical resist etching in O2 and O2/CF4 discharges (1990)
    Springer
    Plasma chemistry and plasma processing 10 (1990), S. 377-399 
    Details
    ISSN: 1572-8986
    Keywords: Resist etching ; radical concentration ; modeling
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract During the etching of AZ 1350 photoresist in O2 and O2/CF4 discharges, ground-state concentrations of atoms (O, F, and H), and small radicals (OH, HO2, RO2) were measured in the discharge afterglow by EPR spectroscopy. In the case of CF4/O2 discharges, the dependence of O and F atom concentrations on the etch time reflects both surfäce oxidation and fluorination reactions in accordance with existing etch models. In the case of high-rate resist etching in pure O2 discharges, high concentrations of product radicals (H, OH and HO2) were detected and compared with resist free O2/H2O discharges. Kinetic modeling of the afterglow reactions reveals that the mean lifetime and, accordingly, the diffusion length of the etchant species O(3P) is drastically reduced in rapid reactions with OH and HO2. The results are used to simulate both etch homogeneity and the loading effect in a simple etch model.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01447199
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  • 9
    Electronic Resource
    Electronic Resource
    Modeling of RF plasma torch with a metallic tube inserted for reactant injection (1991)
    Springer
    Plasma chemistry and plasma processing 11 (1991), S. 103-128 
    Details
    ISSN: 1572-8986
    Keywords: RF plasma torch ; injection probe ; modeling
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract Flow, temperature, and electromagnetic (EM) fields in a radio-frequency thermal plasma torch designed for the preparation of superconducting powders or films have been analysed by using a new two-dimensional modeling approach with the electric field intensity as the fundamental EM field variable. The insertion of a stainless steel injection tube into the torch leads to large induction currents in this tube. Although such large induction currents cause pronounced changes of the EM fields near the injection tube, flow and temperature fields are little affected. There exists only one large toroidal vortex in the upper part of the present torch, while the maximum temperature appears at an off-axis location within the coil region.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01447036
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  • 10
    Electronic Resource
    Electronic Resource
    Study of a transferred-arc plasma reactor with a converging wall and flow through a hollow cathode (1991)
    Springer
    Plasma chemistry and plasma processing 11 (1991), S. 129-150 
    Details
    ISSN: 1572-8986
    Keywords: Thermal plasma reactor ; transferred arc ; converging wall ; modeling
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology
    Notes: Abstract In this paper the behavior of an arc in a transferred-arc plasma reactor with a converging wall geornetrr and flow through a hollow cathode is investigated numerically with emphasis on the fluid dynamics. The general conservation equations and auxiliary relations for the calculation domain are established based on reasonable assumptions Then, the coupled nonlinear differential equations are solved with suitable boundary conditions and temperature-dependent argon plasma properties at atmospheric pressure, by employing an efficient finite-difference method. The results, for a hollow cathode geornetrr with low injection flow rates, clear/y demonstrate the existence of the Maecker elect which is responsible Joy the formation of two recirculation zones. As the plasma gas flow rate is increased, the downstream recirculation zoner is swept away leaving only an upstream recirculation zone.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF01447037
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