Thermally Activated Motion of the Contact Line of a Liquid 4He Meniscus on a Cesium Substrate

A. Prevost, E. Rolley, and C. Guthmann
Phys. Rev. Lett. 83, 348 – Published 12 July 1999
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Abstract

We have measured the contact angle of a liquid helium-4 meniscus on a cesium substrate as a function of the velocity of the three phase contact line, at various temperatures. The velocity is found to vary exponentially with the applied force. We show that the contact line advances through thermally activated jumps. Their area of about 125nm2 is probably related to the roughness of the cesium substrate which is evaporated at low temperature.

  • Received 9 April 1999

DOI:https://doi.org/10.1103/PhysRevLett.83.348

©1999 American Physical Society

Authors & Affiliations

A. Prevost, E. Rolley, and C. Guthmann

  • Laboratoire de Physique Statistique de l'Ecole Normale Supérieure, associé au CNRS et aux Universités Paris 6 et 7, 24 Rue Lhomond 75231, Paris Cedex 05, France

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Vol. 83, Iss. 2 — 12 July 1999

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