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PMMA nanocomposites and gradient materials prepared by means of polysilsesquioxane (POSS) self-assembly

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Abstract

PMMA nanocomposites were prepared by means of self-assembly of polyhedral oligomeric silsesquioxanes (POSS) such as [Si8O12(OSiMe2H)8] (POSS1) and [Si7O9(cyclohexyl)7(OSiMe2H)3] (POSS2) during the free radical methyl methacrylate (MMA) bulk polymerization. The POSS phases separation and self-assembly afforded in situ nanocubes with average diameters ranging from 25 nm to 500 nm. The influence of 5.3 wt.% POSS on the thermal, mechanical and morphological PMMA nanocomposite properties was investigated. POSS mediated nanocube formation was accompanied by improvements of PMMA glass temperature and toughness. Depth profiling by means of ion beam Rutherford backscattering (RBS) analysis indicated the accumulation of POSS1 at the PMMA surface.

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Acknowledgement

The authors gratefully acknowledge the financial support of their research by the Deutsche Forschungsgemeinschaft and SFB 428.

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Authors and Affiliations

  1. Institut für Makromolekulare Chemie and Freiburger Materialforschungszentrum der Albert-Ludwigs-Universität, Stefan-Maier-Str. 31, D-79104, Freiburg i. Br., Germany

    Hans Weickmann, Ralf Thomann & Rolf Mülhaupt

  2. Physikalisches Institut der Albert-Ludwigs-Universität, Hermann-Herder-Str. 3, D-79104, Freiburg i. Br., Germany

    Ralf Delto & Rüdiger Brenn

  3. Fraunhofer Institut für Werkstoffmechanik, Wöhlerstr. 11, D-79108, Freiburg i. Br., Germany

    Walter Döll

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  1. Hans Weickmann
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  2. Ralf Delto
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  3. Ralf Thomann
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  4. Rüdiger Brenn
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  5. Walter Döll
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  6. Rolf Mülhaupt
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Correspondence to Rolf Mülhaupt.

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Weickmann, H., Delto, R., Thomann, R. et al. PMMA nanocomposites and gradient materials prepared by means of polysilsesquioxane (POSS) self-assembly. J Mater Sci 42, 87–92 (2007). https://doi.org/10.1007/s10853-006-1044-1

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  • DOI: https://doi.org/10.1007/s10853-006-1044-1

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