Abstract
Chromium ions implantation was performed into metal–organic chemical vapor deposition grown GaN thin film of thickness about 2 µm at 5 × 1016 cm−2 fluence. Implantation was performed at various substrate temperatures (RT, 250, 350 °C). Rapid thermal annealing was employed at 900 °C to remove implantation-induced damages as well as for activation of dopant. Structural study was performed by Rutherford backscattering and channeling spectrometry and high-resolution X-ray diffraction. To confirm magnetic properties at room temperature, hysteresis loops were obtained using alternating gradient magneto-meter. Well-defined hysteresis loops were achieved at 300 K in implanted and annealed samples. Temperature-dependent magnetization indicated magnetic moment at 5 K and retain up to 380 K.
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Husnain, G., Shu-De, Y., Ahmad, I. et al. Role of substrate temperature on structure and magnetization of Cr-implanted GaN thin film. Appl. Phys. A 117, 2275–2279 (2014). https://doi.org/10.1007/s00339-014-8658-y
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DOI: https://doi.org/10.1007/s00339-014-8658-y