Simultaneous Magnetic and Charge Doping of Topological Insulators with Carbon

Lei Shen (沈雷), Minggang Zeng, Yunhao Lu, Ming Yang, and Yuan Ping Feng
Phys. Rev. Lett. 111, 236803 – Published 5 December 2013
PDFHTMLExport Citation

Abstract

A two-step doping process, magnetic followed by charge or vice versa, is required to produce massive topological surface states (TSS) in topological insulators for many physics and device applications. Here, we demonstrate simultaneous magnetic and hole doping achieved with a single dopant, carbon, in Bi2Se3 by first-principles calculations. Carbon substitution for Se (CSe) results in an opening of a sizable surface Dirac gap (up to 82 meV), while the Fermi level remains inside the bulk gap and close to the Dirac point at moderate doping concentrations. The strong localization of 2p states of CSe favors spontaneous spin polarization via a pp interaction and formation of ordered magnetic moments mediated by surface states. Meanwhile, holes are introduced into the system by CSe. This dual function of carbon doping suggests a simple way to realize insulating massive TSS.

  • Figure
  • Figure
  • Figure
  • Figure
  • Received 20 March 2013

DOI:https://doi.org/10.1103/PhysRevLett.111.236803

© 2013 American Physical Society

Authors & Affiliations

Lei Shen (沈雷)*, Minggang Zeng, Yunhao Lu, Ming Yang, and Yuan Ping Feng

  • Department of Physics, 2 Science Drive 3, National University of Singapore, Singapore 117542, Singapore

  • *shenlei@nus.edu.sg
  • phyfyp@nus.edu.sg

Article Text (Subscription Required)

Click to Expand

Supplemental Material (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 111, Iss. 23 — 6 December 2013

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review Letters

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×