ExLibris header image
SFX Logo
Title: Synchrotron radiation‐excited etching of SiO2with SF6at 143 and 251 Å using undulator radiation
Source:

Applied Physics Letters [0003-6951] Shobatake, K yr:1990


Collapse list of basic services Basic
Full text
Full text available via AIP Digital Archive
GO
Full text available via AIP Journals (American Institute of Physics)
GO
Document delivery
Request document via Library/Bibliothek GO
Users interested in this article also expressed an interest in the following:
1. KIM, K. "POLARIZATION CHARACTERISTICS OF SYNCHROTRON RADIATION SOURCES AND A NEW 2 UNDULATOR SYSTEM." Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment 222.1-2 (1984): 11-13. Link to SFX for this item
2. KRINSKY, S. "AN UNDULATOR FOR THE 700 MEV VUV-RING OF THE NATIONAL SYNCHROTRON LIGHT-SOURCE." Nuclear instruments and methods 172.1-2 (1980): 73-76. Link to Full Text for this item Link to SFX for this item
Select All Clear All

Expand list of advanced services Advanced
A service provided by the Library of the Wissenschaftspark Albert Einstein, Potsdam, Germany.
© 2005 SFX by Ex Libris Inc.