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Title: A study of improving overlay accuracy for a stepper in IC manufacture
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International Journal of Advanced Manufacturing Technology [0268-3768] Lin, Zone-Ching yr:1998


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Users interested in this article also expressed an interest in the following:
1. Chen-Fu, C. "Sampling strategy and model to measure and compensate the overlay errors." Proceedings of SPIE--the international society for optical engineering 4344 (2001): 245-. Link to SFX for this item
2. Seong-Jin, P. "Run-to-run overlay control of steppers in semiconductor manufacturing systems based on history data analysis and neural network modeling." IEEE transactions on semiconductor manufacturing 18.4 (2005): 605-613. Link to Full Text for this item Link to SFX for this item
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