Electronic characterization of polar nanoregions in relaxor-type ferroelectric NaNbO3 films

Biya Cai, J. Schwarzkopf, E. Hollmann, D. Braun, M. Schmidbauer, T. Grellmann, and R. Wördenweber
Phys. Rev. B 93, 224107 – Published 22 June 2016

Abstract

Strained NaNbO3 films of different thicknesses are epitaxially grown on (110) NdGaO3 substrates. A detailed analysis of the permittivity of these films demonstrates that strain not only leads to a modification of the permittivity and the ferroelectric transition temperature, it also results in a pronounced relaxor-type behavior and allows a direct estimation of the size and mobility of the polar nanoregions (PNRs). The compressive strain reduces the transition temperature to 125 K and enhances the corresponding permittivity up to ɛ1500 for the thinnest film. Since the strain relaxes with increasing film thickness, both effects, reduction of phase transition temperature and enhancement of ɛ, depend on the thickness of the film. The films show a characteristic frequency and electric field dependence of ɛ, which is discussed in terms of the Vogel-Fulcher equation and Rayleigh law, respectively. Using the electric field dependence of the resulting freezing temperature TVF, allows a direct estimation of the volume of the PNRs at the freezing temperature, i.e. from 70 to 270nm3. Assuming an idealized spherical shape of the PNRs, diameters of a few nanometers (5.2–8 nm) are determined that depend on the applied ac electric field. The irreversible part of the polarization seems to be dominated by the presence and mobility of the PNRs. It shows a characteristic peak at low temperature around TVF, vanishes at a temperature where the activation energy of the PRNs extrapolates to zero, and shows a frequency dispersion that is characteristic for relaxor-type behavior.

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  • Received 13 October 2015
  • Revised 22 April 2016

DOI:https://doi.org/10.1103/PhysRevB.93.224107

©2016 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Biya Cai1, J. Schwarzkopf2, E. Hollmann1, D. Braun2, M. Schmidbauer2, T. Grellmann1, and R. Wördenweber1

  • 1Peter Grünberg Institute (PGI) and JARA-Fundamentals of Future Information Technology, Forschungszentrum Jülich, D-52425 Jülich, Germany
  • 2Leibniz Institute for Crystal Growth, Max-Born-Straße 2, D-12489 Berlin, Germany

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Issue

Vol. 93, Iss. 22 — 1 June 2016

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