ExLibris header image
SFX Logo
Title: Bimodal substrate biasing to control gamma-AlO deposition during reactive magnetron sputtering
Source:

Journal of Applied Physics [0021-8979] yr:2013


Collapse list of basic services Basic
Sorry, no full text available...
Please use the document delivery service (see below)  
Holding information
Holdings in library search engine ALBERT GO
Document delivery
Request document via Library/Bibliothek GO
Users interested in this article also expressed an interest in the following:
1. Tadaszak, K. "Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process." Materials Science-Poland 30.4 (2012): 323-328. Link to SFX for this item
2. TADASZAK, K. "Electrical characterization of aluminium oxide–aluminium thin film composites by impedance spectroscopy." Microelectronics Reliability 51.7 (2011): 1225-1229. Link to SFX for this item
3. Offenhausser, A. "Comparison of different detectors in low field NMR measurements." Journal of physics. Conference series 234.1 (2010): 12144-12144. Link to Full Text for this item Link to SFX for this item
Select All Clear All

Expand list of advanced services Advanced
A service provided by the Library of the Wissenschaftspark Albert Einstein, Potsdam, Germany.
© 2005 SFX by Ex Libris Inc.