Abstract
The effective parameters for the atmospheric-pressure chemical vapor deposition (APCVD) of borophosphosilicate glass (BPSG) using tetraethylorthosilicate (TEOS) and ozone were evaluated by designing an experiment. Source efficiencies of the deposition and doping were evaluated at constant boron and phosphorus concentrations. Each parameter was also characterized in terms of uniformity and film properties, such as thermal shrinkage and wet etch rate. Interactions between boron and phosphorus were discussed in terms of the difference in influential parameters and reaction rates. The deposition was controlled by the deposition temperature and the deposition rate, which are the dominant parameters of the film quality and deposition efficiency. The balance between gas flow rate and temperature is important to improve deposition and doping uniformity.