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The dependence of Raman defect bands in silica glasses on densification revisited

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An Erratum to this article was published on 30 November 2015

Abstract

This paper focuses on the densification signature measured by Raman spectroscopy in silica-based glasses. We have studied a pure silica glass and a 25GeO2–75SiO2 binary glass fabricated by plasma chemical vapor deposition (PCVD), using the fictive temperature T f as a variable parameter ranging from 950 to 1400 °C. Macroscopic density measurements highlighted two opposite behaviors: the higher the fictive temperature, the lower the density of the GeO2–SiO2 glass, in contrast to what is observed in the pure silica glass. Yet, Raman spectra of both these glasses showed similar trends: the intensities of the two defect bands, D1 and D2, increase with increasing fictive temperature. Therefore, the D1 and D2 bands cannot be used as a reliable signature of densification in binary glasses.

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Authors and Affiliations

  1. Institut de Chimie Moléculaire et des Matériaux d’Orsay, Equipe Synthèse, Propriétés et Modélisation des Matériaux, CNRS-Université Paris Sud, Université Paris-Saclay, Bâtiment 410, 91405, Orsay Cedex, France

    Manon Heili, Bertrand Poumellec & Matthieu Lancry

  2. Prysmian Draka Comteq France SAS, Parc des Industries Artois Flandres, 644 boulevard Est, Billy Berclau, 62092, Haisnes Cedex, France

    Ekaterina Burov & Cédric Gonnet

  3. Géochimie et Cosmochimie, CNRS-IPGP, Sorbonne Paris Cité, 1 rue Jussieu, 75252, Paris, France

    Charles Le Losq & Daniel R. Neuville

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  1. Manon Heili
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  2. Bertrand Poumellec
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  7. Matthieu Lancry
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Correspondence to Matthieu Lancry.

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Heili, M., Poumellec, B., Burov, E. et al. The dependence of Raman defect bands in silica glasses on densification revisited. J Mater Sci 51, 1659–1666 (2016). https://doi.org/10.1007/s10853-015-9489-8

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