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Title: Annealing ultra thin Ta2O5 films deposited on bare and nitrogen passivated Si(100)
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Thin Solid Films [0040-6090] Mao, A Y yr:1999


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1. Duenas, S. "Tantalum pentoxide obtained from TaNx and TaSi2 anodisation: an inexpensive and thermally stable high k dielectric." Solid-state electronics 2001. 1441-1450. Link to Full Text for this item Link to SFX for this item
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3. GRAHAM, D. "DEVELOPMENT OF TANTALUM PENTOXIDE COATINGS BY CHEMICAL-VAPOR-DEPOSITION." Journal of the American Ceramic Society 77.9 (1994): 2298-2304. Link to Full Text for this item Link to SFX for this item
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