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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 525-530 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Deep-level transient spectroscopy (DLTS) and constant-capacitance DLTS (CC-DLTS) techniques have been used to investigate selenium-related DX centers in AlGaAs alloys. The value of the thermal activation energy obtained by both techniques was the same (0.21 eV); however, experimental curves show some important differences. While CC-DLTS curves show only one peak, which reveals that there exists only one DX center in Se-doped AlGaAs, in DLTS curves it is possible to resolve up to two peaks lying at a lower temperature than the one observed by CC-DLTS. This disagreement may be due to the fact that DLTS measurements are strongly affected by refilling effects which occur in the edge zone of the space-charge region during capacitance transients performed at constant voltage. These effects accelerate the capacitance transients and can lead to too high thermal-emission rates. In contrast, these effects do not affect CC-DLTS curves, because in constant-capacitance voltage transients the edge of the space-charge region remains unchanged and refilling effects do not take place. These effects are rather important on DX levels because they exhibit thermally activated capture cross sections and very low ionization factors at the experimental temperatures and, therefore, capture processes are slow and their time constants can be similar to those of the emission processes.
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 4988-4997 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The properties of deep donor states (DX centers) in III-V alloys are discussed in relation to their influence on device characteristics and performance. The techniques to avoid or minimize such deleterious effects in AlGaAs-based devices are discussed, along with their physical basis, and some guidelines for improved III-V device design are established. New results about the benefits of proper donor selection, the role of In alloying, the advantage of δ doping in layers and in modulation-doped devices, and the use of AlInAs and InGaP as alternative wide band-gap III-V alloys are presented.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 57 (1985), S. 5295-5301 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Transient capacitance and photocapacitance techniques have been used to study the characteristics of two electron traps related to Te in GaAs1−xPx: Te. Levels En1 and En2 have thermal activation energies of 0.17 and 0.27 eV, respectively, and their thermal electron emission and capture rates deviate markedly from Schockley–Read–Hall theory for near band gap crossover compositions. Such centers are found for 0.3〈x≤1, are linked to the X conduction band minima, and their photoionization thresholds are 0.5 and 1 eV, respectively. Trap concentrations have been studied as a function of Te doping level, Zn diffusion temperature, and N content (x〉0.4) in GaAsP LEDs. It is suggested that both defects belong to the DX type, and they have been described by a large lattice relaxation model. Franck–Condon energies of 0.3 and 0.95 eV have been determined, respectively. The properties of present Te-related defects are quite similar to donor related centers in AlxGa1−xAs, including the nonexponential capacitance transients found in near x∼0.4 compositions. It is important to mention that both centers have very large hole capture coefficients (σp〉10−14 cm2) and behave as efficient recombination centers.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 88 (2000), S. 2081-2091 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Schottky barrier photovoltaic detectors have been fabricated on n-AlxGa1−xN(0≤x≤0.35) and p-GaN epitaxial layers grown on sapphire. Their characteristics have been analyzed and modeled, in order to determine the physical mechanisms that limit their performance. The influence of material properties on device parameters is discussed. Our analysis considers front and back illumination and distinguishes between devices fabricated on ideal high-quality material and state-of-the-art heteroepitaxial AlxGa1−xN. In the former case, low doping levels are advisable to achieve high responsivity and a sharp spectral cutoff. The epitaxial layer should be thin (〈0.5 μm) to optimize the ultraviolet/visible contrast. In present devices fabricated on heteroepitaxial AlxGa1−xN, the responsivity is limited by the diffusion length. In this case, thick AlxGa1−xN layers are advisable, because the reduction in the dislocation density results in lower leakage currents, larger diffusion length, and higher responsivity. In order to improve bandwidth and responsivity, and to achieve good ohmic contacts, a moderate n-type doping level (∼1018 cm−3) is recommended. © 2000 American Institute of Physics.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 87 (2000), S. 1569-1571 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: GaN:Mg/AlGaN single-heterojunction light-emitting diodes were grown on Si(111) substrates by plasma-assisted molecular-beam epitaxy. High-quality Mg-doped GaN layers with hole concentrations up to 1.2×1017 holes/cm3 and intense low-temperature photoluminescence, which increases in annealed samples, were obtained. Smooth AlGaN layers, with surface roughness below 5 nm, were used as buffer layers. Continuous-wave room-temperature ultraviolet electroluminescence was observed at 365 nm with a full width at half maximum of 8 nm. An estimated optical power output of 1.5 μW was achieved under 15 V/35 mA operation. © 2000 American Institute of Physics.
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  • 6
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We measure the per-carrier nonlinear responses caused by photoexcited carriers in two strained [111]-oriented InGaAs/GaAs multiple-quantum-well structures, and we compare them to that measured in a [100]-oriented structure. Without an external bias, we find that the absorption coefficient changes per photogenerated carrier for the [111]-oriented piezoelectric materials are smaller than for the [100]-oriented materials, not larger, as originally suggested. Subsequently, measurements of the per-carrier nonlinear responses as a function of reverse bias voltage demonstrate that the smaller per-carrier nonlinearities measured for the [111] structures are partially the result of a broadening of the excitons by the huge in-well fields, but can be primarily attributed to the quality of the [111]-grown materials. When corrected for differing in-well fields and for differing excitonic linewidths, the per-carrier responses are similar in magnitude, suggesting that the [111] response may eventually approach that of [100] material, but probably will not significantly exceed it. © 1996 American Institute of Physics.
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  • 7
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The use of room- and low-temperature photoluminescence (PL) spectroscopy for the assessment of n-type pseudomorphic AlGaAs/InGaAs/GaAs high-electron-mobility transistor structures is reported. We describe a method to determine the InAs mole fraction x, the channel layer thickness L, and the confined two-dimensional electron gas density (ns), based on the comparison between the PL transitions and the recombination energies derived from self-consistent calculations of the subband structure. A detailed analysis of the optical transitions and their dependence on the Fermi level position and temperature is performed. It is shown that, in real devices, the high sensitivity of the recombination energies and intensities on small changes of the parameters x, L, and ns allows us to detect deviations from their nominal structural parameters within the uncertainty of the molecular beam epitaxy growth technique. The present assessment procedure has been applied to a significant number of samples, and it has been backed by independent measurements of these parameters by more sophisticated techniques such as Shubnikov–de Haas and PL excitation in standard and gated samples, and by physical techniques like transmission electron microscopy and Auger spectroscopy.
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  • 8
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: By embedding piezoelectric InGaAs/GaAs multiple quantum wells (MQWs) in specifically designed p-i-n structures, we demonstrate that the nonlinear optical response can be used to identify the dominant screening mechanisms and simultaneously to determine the strain distribution. Furthermore, we show that a knowledge of the screening mechanisms and spatial band structure, in turn, can be used to control the nonlinear optical response. For this demonstration, we fabricate two p-i(MQW)-n samples on [111]-oriented GaAs substrates. The samples are designed such that, if the dominant screening is associated with photogenerated carriers that remain in the wells, a blue shift of the exciton would be expected in each. By contrast, if the screening is associated with carriers that have escaped the wells and moved to screen the entire MQW, one will shift to the blue and the other to the red if the lattice is mechanically clamped, but both will shift to the red if the lattice is mechanically free. The observation of a blue shift and a red shift indicates that, while in-well screening may be present, the dominant screening is out-of-well and that these particular structures are mechanically clamped to the lattice constant of the GaAs. Most importantly, these results illustrate the added flexibility that the piezoelectric field gives in tailoring the nonlinear optical response. © 1994 American Institute of Physics.
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 4690-4695 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The incorporation of high concentrations ((approximately-greater-than)1019 cm−3) of Si, Be, and C in InxGa1−xAs relaxed layers has been studied as a function of In content (x≤0.16) by Raman spectroscopy of local vibrational modes (LVM). The frequencies of the Raman peaks resulting from the convolution of several split modes shift to lower values as the In content is increased, the carbon acceptor (CAs) local mode frequency showing the strongest dependency on x. Features attributed exclusively to the influence of In on second-neighbor sites are identified only in the Si-doped samples. The transverse and longitudinal modes expected from the splitting of a LVM of CAs with one In first neighbor are not observed in layers with x up to 0.085. A new calibration for the BeGa, CAs, and Si-related LVM leads to the conclusion that In increases the total electrical activation of Si and favors its incorporation on group-III sublattice sites. In contrast, no influence of In on the Be or C doping activation has been detected. The analysis of the CAs LVM spectra supports the view that in InxGa1−xAs CAs is preferably surrounded by Ga instead of In atoms for x≤0.085. © 1995 American Institute of Physics.
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 7797-7804 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Local vibrational modes (LVM) of Si in substitutional sites have been observed by resonant Raman spectroscopy in highly doped (≥8×1018 cm−3) InxGa1−xAs layers, either relaxed or under strain, on [100] GaAs substrates. The peak frequency ωLVM of the Si on Ga site (SiGa) LVM in unstrained samples shifts to lower values with increasing In content. For x≤0.10 this shift is clearly higher than expected from a linear interpolation between the measured values in the binaries. The comparison between the SiGa peak frequency measured in both a full strained layer and a relaxed layer with similar composition provides a rough determination of the deformation potentials for the SiGaLVM in these layers: q/ω2LVM=−2.7±1 and p/ω2LVM=−2.5±1. As the In content becomes higher the width of the SiGa peak increases much more than that of the GaAs-like longitudinal optical-phonon peak, revealing the splitting due to the loss of local symmetry introduced by the In. New calibration factors for the Si-defect concentrations have been deduced, which allow estimation of the solubility limit for the Si incorporation in substitutional positions, which ranges from 2.3×1019 to 2.6×1019 cm−3 for the layers at the growth conditions used. The analysis of the integrated intensity of the LVM Raman peaks indicates that the degree of electrical compensation is clearly reduced for increasing In up to x≤0.05, due to both an increase of the solubility limit for Si in these layers and a saturation or slight reduction of the SiAs-related defect concentrations. This conclusion is also supported by Hall and plasmon measurements. © 1994 American Institute of Physics.
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