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  • American Institute of Physics (AIP)  (4)
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  • 1
    Digitale Medien
    Digitale Medien
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 77 (2000), S. 537-539 
    ISSN: 1077-3118
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: We have investigated the optical and structural properties of high-quality ZnO films grown on epitaxial GaN (epi-GaN) by plasma-assisted molecular-beam epitaxy employing low-temperature buffer layers. High-resolution x-ray diffraction for both symmetric and asymmetric reflexes shows that crystalline defects in ZnO films have a similarity to epi-GaN used as a substrate. The quality of ZnO epilayers grown on epi-GaN is basically determined by epi-GaN. The photoluminescence (PL) spectrum at 10 K exhibits very sharp exciton emission with a linewidth of 1.5 meV, while deep-level emission is negligible, indicative of small residual strain. At 77 K, PL is dominated by a free-exciton emission line in the low-excitation regime, while it is overtaken by a new emission band due to biexcitons at its low-energy side as the excitation intensity increases. This biexciton emission band emerges even under the intermediate excitation regime of 100 W/cm2, which is 100 times smaller than the previously reported threshold for bulk ZnO. The biexciton binding energy is estimated to be 15 meV, in agreement with previous results. At the higher excitation regime, the emission line due to exciton–exciton scattering dominates the PL spectrum. © 2000 American Institute of Physics.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 2
    Digitale Medien
    Digitale Medien
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 76 (2000), S. 1905-1907 
    ISSN: 1077-3118
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: Photoluminescence (PL) properties of ZnO films grown on CaF2(111) with a low-temperature buffer layer by plasma assisted molecular beam epitaxy are investigated, in which lattice misfit tensile strain is expected to be compensated by the thermal compressive strain. The low-temperature buffer layer is further introduced to accommodate lattice strain leading to the growth of almost strain-free and high quality ZnO films. PL spectra of ZnO layers measured at 10 K are dominated by neutral-donor bound exciton emission at 3.366 eV (I4) with a linewidth of 12 meV. Commonly observed deep level emission at around 2.3 eV is negligibly small in intensity. Free exciton emission develops as temperature is raised and eventually dominates at temperatures higher than 70 K. Detailed study on temperature-dependent PL spectra indicates that the energy position of the free exciton emission is located at the same energy as bulk materials suggesting the growth of strain-free ZnO layers. Consequently, stimulated emission due to exciton–exciton scattering is observed at 77 K. © 2000 American Institute of Physics.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 3
    Digitale Medien
    Digitale Medien
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 77 (2000), S. 4226-4226 
    ISSN: 1077-3118
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: © 2000 American Institute of Physics.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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  • 4
    Digitale Medien
    Digitale Medien
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 77 (2000), S. 3761-3763 
    ISSN: 1077-3118
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: We have investigated the structural and optical properties of Ga-doped ZnO films grown on GaN templates by plasma-assisted molecular-beam epitaxy. The carrier concentration in Ga-doped ZnO films can be controlled from 1.33×1018/cm3 to 1.13×1020/cm3. Despite high Ga incorporation, the linewidth of (0002) ω-rocking curves of Ga-doped ZnO films still lies in the range from 5 to 15 arc min. Photoluminescence (PL) spectra of Ga-doped ZnO films show dominant near-bandedge emission with negligibly weak deep-level emission, independent of carrier concentration. The PL spectrum exhibits a new emission line at 3.358 eV, which corresponds to exciton emission bound to a Ga donor. To avoid degradation of the PL intensity, the maximum dopability of Ga in ZnO is determined to be around 2.6×1019/cm3. © 2000 American Institute of Physics.
    Materialart: Digitale Medien
    Standort Signatur Erwartet Verfügbarkeit
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