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  • 1
    Electronic Resource
    Electronic Resource
    Physical basis for the negative resistance in double heterostructure injection lasers (1973)
    Springer
    Applied physics 2 (1973), S. 173-176 
    Details
    ISSN: 1432-0630
    Keywords: Semiconductor laser ; Negative resistance ; Heterostructure diodes
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Abstract The previously observed negative resistance in double heterostructure diodes is shown to be caused by a trap generated potential barrier near the heterojunctionnGa1-x Al x As−pGaAs. The filling and emplying times were measured by observing the breakdown of the barrier with single and double pulses. Time resolved spectral measurements confirm the model.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00884206
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  • 2
    Electronic Resource
    Electronic Resource
    Electronic property of photosensitive film formed during corrosion of copper in aqueous and non-aqueous solutions of bromine (1973)
    Springer
    Journal of applied electrochemistry 3 (1973), S. 303-305 
    Details
    ISSN: 1572-8838
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Electrical Engineering, Measurement and Control Technology
    Notes: Abstract A photosensitive film was observed on copper plates during corrosion in aqueous and non-aqueous bromine solutions. Sunlight, when incident on the photosensitive film formed, left an image of the markings on the Pyrex glass container through which light was incident on the plate. Photoelectric measurements of the semi-conducting properties of the reaction product of the copper and the bromine solutions have been correlated with image formation. A change in polarity was noted during film formation, the mechanism of which is discussed.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00613037
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  • 3
    Electronic Resource
    Electronic Resource
    Electronic property of photosensitive film on copper in solutions of potassium iodide (1973)
    Springer
    Journal of applied electrochemistry 3 (1973), S. 341-341 
    Details
    ISSN: 1572-8838
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology , Electrical Engineering, Measurement and Control Technology
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/BF00613043
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  • 4
    Electronic Resource
    Electronic Resource
    2-Benzimidazolthiol als Korrosionsinhibitor für Kupfer in Essigsäure und Salzsäure (1972)
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 23 (1972), S. 489-491 
    Details
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: 2-Benzimidazolethiol as a corrosion inhibitor for copper in acetic acid and hydrochloric acid solutionsAn attempt has been made to evaluate the inhibitive power of 2-benzimidazole-thiol for corrosion of copper in acetic acid and hydrochloric acid solutions. The substance acts as an excellent inhibitor for copper in both the systems. This inhibitive action of 2-benzimidazolethiol can be attributed to chelate formation with the metal ion.Polarization measurements reveal that the inhibition is governed principally by the cathodic polarization.
    Notes: 2-Benzimidazolthiol inhibiert die Korrosion von Kupfer sowohl in Essigsäure als auch in Salzsäure. Die Wirkung beruht auf Chelatbildung mit den Metallionen. Aufgrund von Polarisationsmessungen ist die Inhibierung überwiegend kathodisch kontrolliert.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/maco.19720230608
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  • 5
    Electronic Resource
    Electronic Resource
    Action of phenols on the corrosion of 3S aluminium in hydrochloric acid solutions (1973)
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 24 (1973), S. 964-966 
    Details
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: Wirkung von phenolen auf die Korrosion von Al 3S in SalzsäurelösungenDie inhibierende Wirkung einiger Phenole auf die Korrosion von Eisen in 0,5 n Salzsäure ist abhängig von der Konzentration und der Konstitution des jeweiligen Inhibitors. Die Wirkung nimmt ab in der Reihenfolge p-Thiokresol 〉 Pyrogallol 〉 Reihenfolge 〉 Phenol 〉 p-Kresol 〉 m-Kresol 〉 o-Kresol. Der geringe Hemmwert der Kresole scheint durch die Elektronendonator-Wirkung der CH3-Gruppen und durch deren Wechselwirkung mit der ebenfalls als Elektrodonator auftretenden OH-Gruppe bedingt zu sein. Die SH- und OH-Gruppen scheinen die Adsorption an den kathodischen Stellen ebenso zu erleichtern, wie es die π-Elektronen des aromatischen Ringes tun.
    Notes: The inhibiting effect of some phenols on the corrosion of iron in 0.5 N hydrochloric acid depends from the concentration and the constitution of the particular inhibitor. The effect decreases in the following order; p-thiocresol 〉 pyrogallol 〉 resorcinol 〉 phenol 〉 p-cresol 〉 m-cresol 〉 o-cresol. The low inhibiting power of the cresols appears to be due to the cresol appears to be due to the electron donating capacity of th CH3 groups and their interaction with OH groups which is an electron donator, too. The SH and OH groups appear to facilitate the adsorption on cathodic sites as do the π-electrons of the aromatic annulus.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/maco.19730241106
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  • 6
    Electronic Resource
    Electronic Resource
    The molecular structures of benzoic acids and their inhibitive action on 3S aluminium in hydrochloric acid solution (1973)
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 24 (1973), S. 1036-1038 
    Details
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: Wirkung von Phenolen auf die Korrosion von Aluminium 3 S in SalzsäurelösungenUntersucht wurde der Einfluß von Phenol, p-Kresol, o-Kresol, m-Kresol, Pyropgallol, Resorcin und p-Thiokresol auf Korrosion von Aluminium 3 S in 0,5 n Salzsäure. Das kathodische Verhalten wurde dabei galvanostatisch untersucht. Die Wirkung der Inhibitoren ist abhängig von den Substitionen und deren Stellung im Ring. Nimmt ab in Reihenfolge p-Thiokresol  -  Pyrogallol  -  Resorcin  -  Phenol  -  p-Kresol  -  m-Kresol  -  o-Kresol. Die Inhibitoren werden bevorzugt an den kathodischen Stellen adsorbiert.
    Notes: The influence of phenol, p-cresol, o-cresol, m-cresol, pyrogallol, résorcinol and P-thiocresel on the corrosion of A1 3 S in 0.5 n hydrochlorid acid has been studied; the cathodic behaviour was investigated by a galvanostatic method. The efficiency of the inhibitors depends from the substituents and their position in the ring. It decreases in the order p-thiocresol  -  py-rogallol  -  resorcinol  -  phenol - p-cresol  -  m-cresol  -  o-cresol. The inhibitors are preferentially adsorbed at the cathodic sites.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/maco.19730241204
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  • 7
    Electronic Resource
    Electronic Resource
    Influence of azoles as corrosion inhibitor towards 3003 aluminum in trichloroacetic acid solutionPreparation of specimen: A. specimen of 3003 aluminium (3 × 6 cm) was first washed with distilled water several times and dried. It was then rubbed with pumice powder and final polishing was done using jeweller rouge which gave a mirror like finish. The specimen was finally degreased by immersion in sulphur free double distilled carbon tetra chloride. (1974)
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 25 (1974), S. 757-758 
    Details
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: Einfluß von Azolen als Korrosionsinhibitoren für Aluminium 3003 in Trichloressigsäurelösungen2-Mercaptobenzthiazole, 1,2,3-Benztriazol, 2-Methylbenzthiazol sowie Indol sind wirksame Inhibitoren der Korrosion von Aluminium 3003 in 0,1 n Trichloressigsäure. Mit Ausnahme von 1,2,3-Benztriazol, das einen Inhibitor vom Mischtyp darstellt, sind die anderen Substanzen kathodisch wirksam. Die Einführung von -SH-Gruppen erweist sich als günstig. Die Wirkung der Inhibitoren dürfte darauf beruhen, daß die betreffende Substanz an der Metalloberfläche adsorbiert wird und dort stabile Verbindungen zwischen Metall und Schwefel bzw. Stickstoff gebildet werden. Die Bindung mit Schwefel ist dabei stärker.
    Notes: 2-Mercaptobenzthiozole, 1,2,3-benztriazole, 2-methylbenzthiazole and indole are efficient inhibitors of the corrosion of aluminium 3003 in 0.1 N trichloroacetic acid. With the exception of 1,2,3-benztriazole which is a mixed type inhibitor the other compounds are cathodic inhibitors. The introduction of -SH-group is favourable. The effect of the inhibitors may be due to the fact that the particular substance is adsorbed to the metal surface where stable bonds are formed between metal and sulfur and nitrogen respectively. The metal-sulfur bond is stronger.
    Additional Material: 3 Tab.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/maco.19740251012
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  • 8
    Electronic Resource
    Electronic Resource
    p-Anisidin als Korrosionsinhibitor für Messing 63/37 in Essigsäure (1974)
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 25 (1974), S. 438-439 
    Details
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: p-anisidine as a corrosion inhibitor for brass 63 37 in acetic acidThe author have studied the influence of p-anisidine on the corrosion of brass 63 37 in acetic acid (0.05 and 0.5N). According to the result obtained anisidine is a very efficient inhibitor concentration. In view of the fact that application of an external current gives rise to more pronounced polarization of the cathode it appears justified to conclude that the inhibition is cathodically controlled.
    Notes: Die Verfasser haben den Einfluß von p-Anisidin auf die Korrosion von Messing 63/37 in Essigsäure (0,05) n und (0,5 n) untersucht. Danach ist das Anisidin ein sehr guter Inhibitor, dessen Wirkung allgemein mit seiner Konzentration zunimmt. Da bei Anlegen eines äußeren Stromes die Kathode stärker polarisiert wird als die Anode, wird angenommen, daß die Hemmung kathodisch kontrolliert ist.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/maco.19740250607
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  • 9
    Electronic Resource
    Electronic Resource
    Aliphatische Amine als Inhibitoren für Essigsäure (1970)
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 21 (1970), S. 809-811 
    Details
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: Aliphatic amines as inhibitors for acetic acidExperimental work with methyl, ethyl, isopropyl and cyclohexyl amines and cold rolled brass in 0.05 to 0.5 N acetic acid have shown, that inhibition arrives at its maximum when the solution is neutralized by the added amine; higher amine doses may increase corrosion.
    Notes: Versuche mit Methylamin, Äthylamin, Isopropylamin und Cyclohexylamin und kaltgewalztem Messing in 0,05 bis 0,5 n Essigsäure zeigen, daß die Inhibierung ihr Maximum erreicht, wenn die Lösung durch das Amin neutralisiert ist; höherer Inhibitorzusatz kann die Korrrosion verstärken.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/maco.19700211008
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  • 10
    Electronic Resource
    Electronic Resource
    Wirkung von schwefelhaltigen Inhibitoren auf die Korrosion von Messing 63/37 in Trichloressigsäure (1972)
    Weinheim [u.a.] : Wiley-Blackwell
    Materials and Corrosion/Werkstoffe und Korrosion 23 (1972), S. 491-491 
    Details
    ISSN: 0947-5117
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Description / Table of Contents: Action of sulphur containing inhibitors on the corrosion of 63/37 brass in trichloroacetic acidTrichloroacetic acid is highly corrosive to brass. Sodium thioglycolate, sodium diethyl dithio carbamate and carbon disulphide have been studied as corrosion inhibitors for brass (63/37) in trichloroacetic acid. The inhibitive power of sulphur-containing organic compounds is due to chelate formation, the chelate adhering strongly to the metal surface. The efficiencies of above stated inhibitors were found in the following order: \documentclass{article}\pagestyle{empty}\begin{document}$$ {\rm Na - DDC}\,{\rm 〉 }\,{\rm CH}_{\rm 2} {\rm (SH)COONa}\,{\rm 〉 }\,{\rm CS}_{\rm 2} $$\end{document}.
    Notes: Trichloressigsäure greift Messing stark an. Natriumthioglycolat, Natriumdiäthyldicarbamat und Schwefelkohlenstoff sind als Inhibitoren der Korrosion von Messing 63/37 in Trichloressigsäure untersucht worden. Die inhibierende Wirkung von schwefelhaltigen organischen Verbindungen beruht auf Chelatbildung, wobei das Chelat an der Metalloberfläche festhaftet. Die Wirkung der oben genannten Inhibitoren nimmt in der folgenden Reihe ab: \documentclass{article}\pagestyle{empty}\begin{document}$$ {\rm Na - DDC}\,{\rm 〉 }\,{\rm CH}_{\rm 2} {\rm (SH)COONa}\,{\rm 〉 }\,{\rm CS}_{\rm 2} $$\end{document}.
    Additional Material: 1 Tab.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/maco.19720230609
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