ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
A thin Y-Ba-Cu-O film was formed by the organometallic chemical vapor deposition (OMCVD) method. The substrates used were (100) and (110) SrTiO3. After forming Y-Ba-Cu-O at 800 °C, it was cooled at a rate of 100 °C/min in O2 under 1 atm. This film was c-axis oriented, with its (001) surface grown in parallel to the (100) surface of SrTiO3 and Tc =88 K. The (110) surface of Y-Ba-Cu-O was grown in parallel to the substrate crystal and Tc =84 K on the (110) surface of SrTiO3. After forming, these films were quenched in air from 800 °C to room temperature. The change in resistance of the quenched sample with temperature was metallic, Tonset =75 K, and Tc =60 K.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.101492
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