ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
This paper presents a novel, rapid and damage-free method to polish the ultra-smoothsurface of the SiC optics. First, the basic philosophy of this method is introduced, which uses theactive radicals got from CF4 in the atmospheric pressure plasma zone to react with the SiC material atthe optics surface to generate the vaporization of SiF4. Then, the design of the atmospheric pressureplasma jet and the corresponding prototyping polishing facility are introduced. The theoreticalanalysis on the necessary conditions to generate the excited radicals is also presented in this part. Toverify the effectiveness of this novel polishing method, experiments on the generation of atmosphericpressure plasma and the SiC optics polishing are carried out with our prototyping facility. Theexperiment results show that plasma discharge is stable at the atmospheric pressure andsub-nanometer roughness of the polished SiC surface can be obtained
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/14/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.532-533.504.pdf
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