Publication Date:
2016-01-01
Description:
A unique analytical method is proposed for local structure analysisviaextended X-ray absorption fine structure (EXAFS) spectroscopy. The measurement of electron energy distribution curves at various excitation photon energies using an electron energy analyzer is applied to determine a specific elemental Auger spectrum. To demonstrate the method, the NK-edge EXAFS spectra for a silicon nitride film were obtainedviasimultaneous measurement of the NKLLAuger and background spectra using dual-energy windows. The background spectrum was then used to remove the photoelectrons and secondary electron mixing in the energy distribution curves. The spectrum obtained following this subtraction procedure represents the `true' NK-edge EXAFS spectrum without the other absorptions that are observed in total electron yield NK-edge EXAFS spectra. The first nearest-neighbor distance (N—Si) derived from the extracted NK-edge EXAFS oscillation was in good agreement with the value derived from SiK-edge analysis. This result confirmed that the present method, referred to as differential electron yield (DEY)-EXAFS, is valid for deriving local surface structure information for low-Zelements.
Print ISSN:
0909-0495
Electronic ISSN:
1600-5775
Topics:
Geosciences
,
Physics
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