ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Fluorinated nanocrystalline silicon films, nc-Si:H,F, have been deposited from SiF4–SiH4–H2 mixtures by means of the plasma enhanced chemical vapor deposition technique. The presence of fluorine atoms, which are effective etchant species, promotes selective etching giving nanocrystalline films. These materials, with grain size of 100–200 A(ring), show a room temperature photoluminescence centered at 1.62 eV. Also, the widening of the optical energy gap (Eg=2.12 eV) is mainly due to the presence of nanocrystals rather than to the H content of 4.5 at. %. © 1996 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.363641
Permalink