ISSN:
1662-8985
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Diamond coatings on pure titanium substrates are of interest for tribological andbiomedical implants. However, due to the different thermal expansion coefficients of the twomaterials, the complex nature of the interlayer formed during diamond deposition, and the difficultyin achieving very high nucleation density, it is hard to deposit adherent thin diamond layers ontitanium. The aim of the present research was to successfully produce smooth and well adherentnanocrystalline diamond (NCD) film on a pure Ti substrate using the microwave plasma chemicalvapor deposition (MWPCVD) method. The influence of Argon addition to CH4/H2 plasma on thecrystallinity, morphology and growth of the diamond film deposited by MWPCVD was investigatedusing field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM), Xraydiffraction (XRD) and Raman spectroscopy
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/40/transtech_doi~10.4028%252Fwww.scientific.net%252FAMR.26-28.615.pdf
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