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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 4366-4371 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: To determine the influence of interface type on the accumulation of damage and ion mixing in GaAs/AlxGa1−xAs heterostructures, the damage produced by ion implantation at 77 K in single-layer (GaAs/AlxGa1−xAs/GaAs) and double-layer (GaAs/AlxGa1−xAs/GaAs/ AlxGa1−xAs/GaAs) heterostructures has been investigated by using a combination of Rutherford backscattering spectrometry and transmission electron microscopy. In the single-layer geometry, the degree of disorder increases with depth and the mixing is greater at the AlxGa1−xAs on GaAs interface than at the GaAs on AlxGa1−xAs one. The damage distribution in the sample with the double-layer geometry was different in the two layers, but overall it was similar to that in the single-layer geometry. These trends were observed in samples with x=0.6 and 0.2. These results indicate that migration of charged defects due to the presence of an implantation-induced electric field is not responsible for the asymmetry in the damage accumulation across the layer, the interface disorder and ion mixing, and the initiation of amorphization at interfaces. Instead, these effects can be better understood in terms of the depth dependence of the density of cascade events. © 1996 American Institute of Physics.
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 4609-4614 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A detailed study of the luminescence properties of GaN layers grown by metalorganic chemical vapor deposition on sapphire substrates with GaN/AlN double buffer layers or GaN single buffer layers was carried out with photoluminescence and cathodoluminescence (CL) spectroscopy. It was discovered that the use of the double buffer layer resulted in an improved surface morphology, but also increased the strain in the samples relative to samples grown on single GaN buffer layers. Free exciton (A exciton), neutral donor-bound exciton, and acceptor-bound exciton photoluminescence peaks were observed for GaN films grown on GaN, AlN, and GaN/AlN buffer layers. Acceptor free-to-bound luminescence was also observed and the thermal activation energy of the acceptors was measured. From these data we are able to determine the acceptor binding energy, EA, to be 231.5 meV and the donor binding energy ED to be 29.5 meV. An exciton peak, the acceptor free-to-bound luminescence, and an unidentified lower energy peak were observed with CL. CL imaging also allowed us to correlate luminescence with surface features of the films. e-beam annealing of both n-type and p-type films was investigated. © 1996 American Institute of Physics.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 2687-2690 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A GaN p-n junction structure was grown on a (0001) sapphire substrate by atmospheric pressure metalorganic chemical vapor deposition using a double buffer layer. The resulting light emitting diode (LED) was further exposed to a low-energy electron beam source. The effect of e-beam exposure on the room-temperature electroluminescence spectra of the LED is reported. It is found that the electroluminescence spectral features change dramatically as a function of the electron-beam exposure time and current density. This is attributed to changes in active Mg concentration. The origin of each electroluminescence band is discussed. © 1996 American Institute of Physics.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 78 (1995), S. 97-103 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The damage produced at the interfaces in a sample of GaAs/Al0.6Ga0.4As/GaAs that has been subjected to ion implantation at 77 and 293 K with 1 MeV Kr+ ions has been investigated using a combination of ion channeling and transmission electron microscopy (TEM) techniques. Low temperature ion-channeling spectra obtained from samples implanted at 77 K, to an ion dose of 1014 ions cm−2, were similar to the random spectrum, indicating that the GaAs and Al0.6Ga0.4As layers had sustained a considerable degree of damage. An asymmetric signal developed in the He+ ion-channeling spectrum as the sample warmed to room temperature. The backscattering yield corresponding to the bottom interface (i.e., Al0.6Ga0.4As grown on GaAs) resembled that of the random yield, whereas that from the top interface (GaAs grown on Al0.6Ga0.4As) decreased, shifting toward the unirradiated channeled spectrum. This observation suggests that the damage produced near the top of the Al0.6Ga0.4As layer is thermally unstable. Cross-sectional TEM images reveal a greater amount of damage in the form of extended defects and amorphous regions at the bottom interface than at the top one. This difference is sufficient to account for the observed asymmetry in the channeling spectra. Increasing the ion dose to 1015 ions cm−2 produced a damage state throughout the Al0.6Ga0.4As layer that was stable at both 77 and 293 K. TEM examination revealed that at this ion dose the GaAs and Al0.6Ga0.4As layers were both amorphous. Room-temperature implantation to a dose of 1×1016 ions cm−2 was also performed. Planar defects were observed at both interfaces, although their density appeared to be greater near the bottom interface.In addition, the bottom interface was rougher than the top. The difference in the damage states at the bottom and top interfaces can be attributed to a variation in the number of displacement cascade events as a function of depth through the Al0.6Ga0.4As layer. This variation in the number of cascades results in different amounts of ion mixing at the top and bottom interfaces. © 1995 American Institute of Physics.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 1879-1882 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Gain characteristics are reported for a series of five separate confinement heterostructure InxGa1−xAs-GaAs-Al0.20Ga0.80As (0.08〈x〈0.33) strained-layer quantum well lasers with a 70 A(ring) well thickness. The differential current gain β increases with indium composition from 14.2 for x=0.16 to 27.4 cm/A for x=0.33, as calculated from a semilogarithmic gain-current density relation. Data are also presented on emission wavelengths and threshold current as a function of composition and cavity length. Devices with x=0.08 are unable to reach threshold on the quantum well transition, and laser operation in the barriers is observed for all cavity lengths. Devices with higher indium fraction switch from the n=1 transition in the quantum well for long cavity lengths to the n=2 transition and to the GaAs barriers for short cavities due to saturation of the available quantum well gain.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 3543-3545 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Ion-beam mixing in AlxGa1−xAs and InP matrices was measured as a function of irradiation temperature using 1 MeV Kr ion irradiation. For these III–V compound semiconductors, the mixing increased with temperature up to a critical temperature Tc at which point it precipitously dropped. Tc was identified as the amorphous-to-crystalline transition temperature in these materials under 1 MeV Kr irradiation. © 1995 American Institute of Physics.
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 1423-1427 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The transport properties of heterostructure hot-electron diodes are examined by Monte Carlo simulations. The transient analysis indicates that the limiting time constant for electronic switching from low to high conduction is of the order of the device transit time provided that tunneling- and thermionic-emission time constants associated with the formation of accumulation layers are of shorter duration; since the average electron velocities are of the order of 3×107 cm/s for typical device dimensions of 1000 A(ring), it follows that picosecond switching times should be possible for such device feature sizes. The effects of electron-electron interactions have also been considered; their influence on diode switching and on the switching of heterolayer devices in general are discussed.
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 5001-5008 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The growth of GaAs irradiated with ultraviolet laser light in a metalorganic chemical vapor deposition reactor has been investigated. Growth rate enhancements of up to 15% were observed at 450 °C by illuminating the substrate with no more than 13 mJ/cm2 of KrF laser (248 nm) radiation. For 5-eV photons, arsine is virtually transparent, while the trimethylgallium (TMG) photoabsorption cross section is approximately 10−19 cm2. Data acquired with and without the optical beam impinging on the substrate are well described by the Langmuir–Hinshelwood model, and the results point to photodissociation of adsorbed TMG as the origin of the growth rate enhancement. Nearly identical experiments carried out at 351 nm (XeF) corroborate this conclusion since no measurable increase in growth rate was observed at this wavelength, where both arsine and TMG photoabsorption is negligible. Conversely, significant improvement in surface morphology for samples grown below 700 °C is observed with ultraviolet laser irradiation of the substrate at each of the wavelengths investigated (193, 248, and 351 nm). Smooth and specular surfaces are obtained with substrate temperatures as low as 550 °C and at fluences well below those which induce a significant rise in the surface temperature.
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 60 (1986), S. 677-680 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Both secondary ion mass spectrometry and transmission electron microscopy have been used to characterize Au–Ni–Ge and Au–Ag–Ge ohmic contacts to modulation-doped GaAs/AlGaAs heterostructures. The time periods for alloying the contact were kept to a minimum (〈25 s) in order to obtain controlled diffusion of Ge into the semiconductor. Structural analysis shows that a stable alloy contact is formed after 3 s of alloying at temperatures above the Au–Ge melting point. There were no major structural or compositional changes observed with longer alloying times. The Ge-rich region has a tendency to regrow epitaxially on the GaAs after alloying, as shown by high-resolution electron microscopy.
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 982-983 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: An alternative masking method for high-voltage ion implantation masking of compound semiconductors which incorporates an additional AlGaAs layer between a Pb/Cr/Au metal mask and the sample to be implanted is described. Following patterning by conventional techniques and implantation, the AlGaAs layer is selectively etched to remove the metal mask without damaging the underlying epitaxial structure.
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