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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 1571-1576 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This paper reports an empirically based correlation between the metastable defect density and the value and temperature dependence of the Fermi energy in undoped hydrogenated amorphous silicon. According to this correlation, to specify two of the three quantities: Fermi energy, defect density, and temperature, is to specify the third, independent of the history of the sample. Almost 300 measurements of dark conductivity over a wide range of defect densities and temperatures, obtained in the course of measuring the kinetics of optical degradation of amorphous silicon at four temperatures, were subjected to analysis. A detailed empirical summary of these data is given, since their relevance extends beyond this present work. A model with two different types of multivalent defects whose relative density changes with total defect density is the simplest model consistent with the data.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 1926-1934 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Measurements of defect density, photoconductivity, and dark conductivity are used to obtain information about the values of the electron capture cross sections of charged and neutral metastable dangling-bond defects in high-quality, undoped, hydrogenated amorphous silicon at room temperature. Sixty measurements, obtained in the process of optical degradation experiments as a function of time at four different temperatures, have been analyzed using photoconductivity models corresponding to either one or two types of discrete-level, multivalent defects. A model with two types of defects is able to accurately describe both dark conductivity and photoconductivity results, and gives the following average values: an electron capture cross section of about 1×10−16 cm2 for neutral centers of both higher-lying (density not increased by light) and lower-lying (density increased by light) defects, of about 2×10−16 cm2 for positively charged higher-lying defects, and of about 20×10−16 cm2 for positively charged lower-lying defects. © 1996 American Institute of Physics.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 2673-2679 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Homoepitaxial p-type CdTe films were grown by coevaporation of CdTe and phosphorus in vacuum, where the phosphorus vapor was ionized and accelerated toward the substrate. Hole densities up to 2×1017 cm−3 were obtained using an ion energy of 60 eV. Effects of residual ion damage were observed using cross-sectional transmission electron microscopy, etch-pit density, and minority-carrier diffusion length measurements. This ion damage is dependent on both the ion dose and the ion energy. Reducing the ion energy below 60 eV results in lower doping densities, but using electron irradiation and Cd overpressure during deposition makes it possible to achieve equivalent doping levels for 20 eV ions while reducing the ion damage. At an ion energy of 20 eV, using electron irradiation of the growing film, and a 0.2% overpressure of Cd, films with hole density of 1×1017 cm−3 and diffusion length of 0.35 μm were obtained. Photovoltaic behavior of the films deposited in different conditions was tested by fabricating n-CdS/p-CdTe heterojunctions.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 65 (1989), S. 3552-3559 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Metal-semiconductor and metal-insulator-semiconductor junctions, involving the thermal oxide cadmium tellurite (CdTeO3), have been fabricated on both p- and n-type cadmium telluride (CdTe) single crystals. The oxide is effective in increasing the photovoltaic performance of these junctions only in the case of n-type material. For n-type CdTe, the oxide increases the open- circuit voltage over that of the Schottky barrier, whereas for p-type CdTe the oxide decreases the open-circuit voltage. These and several other junction properties may be understood in terms of proposed energy-band diagrams for Cr/CdTeO3/p-CdTe and Au/CdTeO3/n-CdTe structures
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 1876-1885 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The properties of Au/thermal oxide/p-InP metal-interfacial layer-semiconductor (MIS) junctions have been investigated. Thin InP thermal oxides are stable and in the dark are positively charged so as to increase the band bending and reduce the forward leakage currents in MIS junctions. Under illumination, photogenerated electrons are trapped in the oxide or near the oxide/InP interface such that MIS junctions exhibit photosuppression and hysteresis effects.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 820-828 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Nine recombination-driven mechanisms are possible in principle for the kinetics and steady-state effects of illumination on defects in hydrogenated amorphous silicon. By comparing the different mechanisms, and making choices based on the experimental observation that the carrier lifetime varies inversely with the metastable defect (dangling bond) density, these nine are reduced to three. They correspond to recombination that generates metastable defects (1) taking place at metastable defects, (2) being associated with direct electron-hole recombination, or (3) taking place at other specific defect sites in the material. Each of these three models is considered under the assumptions that (a) the rate constants involved are not functions of time, and (b) the rate constants involved are functions of time in a way similar to that observed for the decay of thermally induced defects, described by a stretched exponential formulation. Comparison with experimental data on kinetics as a function of time and light intensity indicates that both models 2a and 1b are capable of describing the reported results. If, however, it is maintained that all defect-related kinetics in amorphous silicon should exhibit the dispersive behavior leading to the stretched exponential description, then only model 1b is acceptable. Experiments for distinguishing between models 2a and 1b are suggested.
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 62 (1987), S. 1469-1476 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thermal oxidation of single-crystal p-type CdTe has been carried out in dry and wet oxygen. The thickness of the oxide varies as the square root of oxidation time, implying a diffusion controlled process. The activation energy for thermal oxidation is 1.2 eV. Examination of the oxide by Auger electron spectroscopy, x-ray photoelectron spectroscopy, and transmission electron microscopy shows that the composition of thick layers is CdTeO3; thin layers less than 100 A(ring) thick may differ slightly in composition. An oxygen gradient is detected in as-grown thin oxides, but with storage in air at room temperature the oxygen gradient disappears. Values of chemical shift of the x-ray photoelectron spectroscopy peaks for the cadmium-tellurium-oxygen ternary system are clarified.
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 61 (1987), S. 1556-1561 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The behavior of a semiconductor contact is usually represented by the specific contact resistance determined by a dc measurement. A copper-gold contact on p-type cadmium telluride is used to illustrate the influence of the ac contact impedance on standard semiconductor measurements such as capacitance versus voltage, admittance spectroscopy, and deep-level transient spectroscopy. These experimental results show that a semiconductor contact with negligible dc voltage drop may have a significant influence on high-frequency, low-temperature, or fast-transient measurements. Knowledge of the contact capacitance as well as the contact resistance is necessary to predict the influence of the contact.
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 60 (1986), S. 3622-3630 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The optical and electrical properties of grain boundaries in n- and p-type CdTe have been investigated by analysis of single boundaries within bicrystals and of polycrystalline thin films. The grain-boundary parameters evaluated include the conductivity activation energy, the boundary diffusion potential, the energy distribution of grain-boundary states, the minority-carrier recombination velocity, the majority–carrier capture coefficient, and the optical cross section of grain-boundary states. Passivation experiments indicate that heat treatment in H2 or Li provide effective but temporary passivation in p-type CdTe, and that similar effects are found for heat treatment in air for n-type material.
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  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 880-889 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Low-resistance contacts to p-type CdTe have been made by diffusing Li into the CdTe surface before evaporation of Au as the contact metal. The best contact showed a contact resistivity of 2.1×10−3 Ω cm2 at room temperature, and 3.7×10−2 Ω cm2 at liquid N2 temperature, the lowest values reported to date for p-type CdTe. Surface analysis of the Li-diffused surface indicates that the crystalline structure of the CdTe surface has been greatly disturbed and a Te-rich surface layer is produced. Te tends to out-diffuse with time through the Au layer to restore the stoichiometric Te/Cd ratio in the CdTe. A metal-insulator-semiconductor tunnel diode model qualitatively explains the observed current-voltage characteristics of the contacts. Numerical analysis shows good agreement between the calculated contact resistivities and the experimental data. Surface states and fixed charges in the insulator play an important role in the current-voltage characteristics through the modification of metal work function and the distribution of the applied voltage. Contact resistivity increases with decreasing hole concentration, but the effect is small if a high enough density of interface states dominates the properties of the contact.
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